TECHNOLOGY LICENSING OPPORTUNITY: Electroplated Materials and Array Design for Scintillators

Project ID: S-133996 FederalOpportunitiesSpecial Notice

Overview

Agency	Department of Energy
Deadline	02/12/26
Posted	01/21/26
Estimated Value	Not Provided
Set Aside	None
NAICS	541715 - Research and Development in the Physical, Engineering, and Life Sciences (except Nanotechnology and Biotechnology)
PSC	AJ12 - General Science And Technology R&D Services; General Science And Technology; Applied Research
Location	Los Alamos, NM 87545 United States

Description

Primary Latest Change

Summary

Modern scintillator grids are essential to radiation detection systems that require high spatial resolution and fast response. However, current grid fabrication methods rely on hazardous chemical etching and produce inconsistent structures that limit performance, scalability, and safety. This capability addresses the limitations of current fabrication methods by eliminating hazardous chemical etching, improving uniformity, and enabling complex geometries at scale. Advantages - Enables high-resolution grid fabrication from high-Z metals (e.g., Re, Au, Re/Ni) - Avoids toxic and hazardous chemicals associated with traditional etching - Supports scalable production of precision-aligned, high-Z scintillator arrays with low material loss - Provides micron-level dimensional control and uniformity - Compatible with multiple scintillator materials and array configurations, enabling customization for medical, industrial, and defense applications - Adaptable to custom geometries for specialized imaging or detection applications

Technology Description

This technology enables the fabrication of dense, high-resolution scintillator grid arrays with micron-level precision, suitable for advanced radiation detection and imaging applications. The process works by electroplating high-Z metals, such as rhenium (Re), gold (Au), or their alloys, onto a substrate in the shape of the final grid geometry. These electro-formed components are then joined using hot isostatic pressing (HIP) at metal-specific temperatures and pressures to form solid bonded structures. Finally, the substrate is dissolved, leaving behind a free-standing, precision-aligned grid array. This approach eliminates chemical hazards, improves feature uniformity, and supports complex geometries, making it suitable for both small- and large-scale detector production.

Market Applications

This technology supports next-generation imaging and detection systems where high resolution, precision fabrication, and material efficiency are critical. This process can benefit: - Fabricating CT, PET, and SPECT detector arrays for medical imaging - Developing radiation detection systems for homeland security or military use - Producing NDT imaging systems for aerospace and industrial inspection - Supporting nuclear energy monitoring with compact, rugged detection grids - Enabling advanced materials R&D for photonic and meta-material applications https://www.lanl.gov/engage/collaboration/feynman-center/tech-and-capability-search/electroplated-scintillators

LANL Tech Partnerships

Unlock the Innovative Potential Los Alamos National Laboratory offers a wide range of cutting-edge technologies and capabilities that may provide your company with a competitive edge in the market and unlock the innovative potential that can enhance, refine, and revolutionize your products. LANL's licensing program focuses on moving inventions developed by our researchers to commercial innovations. Patented and patent pending inventions and copyrighted software are available to existing and start-up companies through exclusive and non-exclusive licensing agreements. For specific discussions, please contact licensing@lanl.gov. Note: This is not a call for external services for the development of this technology. https://www.lanl.gov/engage/collaboration/feynman-center/partner-with-us/licensing-technology https://www.lanl.gov/engage/collaboration/feynman-center/tech-and-capability-search

Summary (Newest Update)

Background Los Alamos National Laboratory (LANL) is seeking to advance the fabrication of high-resolution scintillator grids, which are crucial for radiation detection systems that require high spatial resolution and fast response. The goal of this contract is to address the limitations of current grid fabrication methods that rely on hazardous chemical etching, thereby improving performance, scalability, and safety. Work Details The contract involves the development of a scalable method for fabricating high-resolution scintillator grids using electroplating and hot isostatic pressing. Key tasks include: - Fabricating dense, high-resolution scintillator grid arrays with micron-level precision suitable for advanced radiation detection and imaging applications. - Electroplating high-Z metals such as rhenium (Re), gold (Au), or their alloys onto a substrate shaped like the final grid geometry. - Joining electro-formed components using hot isostatic pressing (HIP) at specific temperatures and pressures to form solid bonded structures. - Dissolving the substrate to leave behind a free-standing, precision-aligned grid array. - Ensuring compatibility with multiple scintillator materials and array configurations for customization in medical, industrial, and defense applications. - Advancing production readiness through validation across multiple metals and configurations while refining substrate removal protocols. Place of Performance The contract work will primarily be performed at Los Alamos National Laboratory.

Contacts

Contact name	Satya Srinivasan
Contact email	licensing@lanl.gov
Contact phone	None
Secondary contact name	Lindsay Augustyn
Secondary contact email	licensing@lanl.gov
Secondary contact phone	None